Internal Stress in the Porous Anodic Alumina/Aluminum System

Abstract

The internal stresses of the aluminum films deposited at various substrate temperatures and evaporation rates are studied. It is shown that tensile stresses are present in the aluminum film. The tensile stresses values are equal to (1.0-3.5)•10 7 N/m 2 to be comparable with the aluminum yield point (2.3•10 7 N/m 2 ). Theoretical and experimental studies of deformation and stress at the porous aluminum oxide-aluminum interface are discussed. It is shown that the internal stresses in the growing porous oxide are always compressive stresses and practically do not depend on the internal stresses in the initial aluminum film. The last testifies the fact of reaching the aluminum yield point at the oxide formation.