| DC Field | Value | Language |
|---|
| dc.contributor.author | Nguyen, V. T. A. | - |
| dc.coverage.spatial | Минск | ru_RU |
| dc.date.accessioned | 2023-05-26T06:12:30Z | - |
| dc.date.available | 2023-05-26T06:12:30Z | - |
| dc.date.issued | 2023 | - |
| dc.identifier.citation | Nguyen, V. T. A. Simulation of reactive magnetron sputtering system for deposition of thin films / Nguyen V. T. A. // Электронные системы и технологии : сборник материалов 59-й научной конференции аспирантов, магистрантов и студентов БГУИР, Минск, 17–21 апреля 2023 г. / Белорусский государственный университет информатики и радиоэлектроники ; редкол.: Д. В. Лихаческий [и др.]. – Минск, 2023. – С. 1170–1173. | ru_RU |
| dc.identifier.uri | https://libeldoc.bsuir.by/handle/123456789/51582 | - |
| dc.description.abstract | This paper simulates a magnetron sputtering system based on main design features to visualize the thin film formation process. The article presents the main design features of the magnetron sputtering system that affect the speed and quality of sputtering, contributing to an increase in the productivity of thin film deposition. | ru_RU |
| dc.language.iso | en | ru_RU |
| dc.publisher | БГУИР | ru_RU |
| dc.subject | материалы конференций | ru_RU |
| dc.subject | magnetron system | ru_RU |
| dc.subject | magnetron sputtering | ru_RU |
| dc.subject | rotating structure | ru_RU |
| dc.title | Simulation of reactive magnetron sputtering system for deposition of thin films | ru_RU |
| dc.type | Article | ru_RU |
| Appears in Collections: | Электронные системы и технологии : материалы 59-й конференции аспирантов, магистрантов и студентов (2023)
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