https://libeldoc.bsuir.by/handle/123456789/11060
Название: | The increase in thickness uniformity of films obtained by magnetron sputtering with rotating substrate |
Авторы: | Golosov, D. A. Melnikov, S. N. Zavadski, S. M. Kolos, V. V. Okojie, J. |
Ключевые слова: | публикации ученых;magnetron sputtering;deposition rate;film thickness |
Дата публикации: | 2016 |
Издательство: | Department of Physics |
Описание: | The increase in thickness uniformity of films obtained by magnetron sputtering with rotating substrate / D. A. Golosov and other // Plasma Physics and Technology. - 2016. - Vol. 3, № 3. - P. 100-104. |
Аннотация: | The titanium thin films obtained by magnetron sputtering with the rotating substrate at different distances between the substrate and magnetron centers were studied with regard to the uniformity of the film thickness distribution. On the basis of the experimental data obtained, the model for the magnetron film deposition during substrate rotation was developed. The analysis of the simulation results shows that the model error is not greater than 10%. |
URI: | https://libeldoc.bsuir.by/handle/123456789/11060 |
Располагается в коллекциях: | Публикации в зарубежных изданиях |
Файл | Описание | Размер | Формат | |
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The increase.pdf | 1.95 MB | Adobe PDF | Открыть |
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