| DC Field | Value | Language |
|---|
| dc.contributor.author | Prischepa, S. L. | - |
| dc.contributor.author | Dolgiy, A. L. | - |
| dc.contributor.author | Bandarenka, H. V. | - |
| dc.contributor.author | Yanushkevich, K. I. | - |
| dc.contributor.author | Nenzic, P. | - |
| dc.contributor.author | Balucani, M. | - |
| dc.contributor.author | Bondarenko, V. P. | - |
| dc.date.accessioned | 2016-11-22T08:43:17Z | - |
| dc.date.accessioned | 2017-07-27T12:19:20Z | - |
| dc.date.available | 2016-11-22T08:43:17Z | - |
| dc.date.available | 2017-07-27T12:19:20Z | - |
| dc.date.issued | 2012 | - |
| dc.identifier.citation | Electrochemical Deposition of Ni into Mesoporous Silicon / A. Dolgyia and others // ECS Transactions. – 2012. – № 41(35). – Р. 111 – 118. | ru_RU |
| dc.identifier.uri | https://libeldoc.bsuir.by/handle/123456789/10177 | - |
| dc.description.abstract | Nickel nanowires have been formed by the stationary electrochemical deposition of
nickel into mesoporous silicon from the modified Watts bath. The polycrystalline nature
of the Ni deposit has been established as well as expansion of its lattice parameter in
comparison with bulk nickel. Control of the potential of porous silicon during
electrochemical deposition allows to determine the moment of complete filling of pore
space with Ni. The maximum achieved filling factor was 67% of the pores. The pore
dimensions have been found to define the length and the diameter of the Ni nanowires
that have equaled to 10 um and 100-120 nm, respectively. | ru_RU |
| dc.language.iso | en | ru_RU |
| dc.publisher | ECS Transactions | ru_RU |
| dc.subject | публикации ученых | ru_RU |
| dc.title | Electrochemical Deposition of Ni into Mesoporous Silicon | ru_RU |
| dc.type | Article | ru_RU |
| Appears in Collections: | Публикации в зарубежных изданиях
|
