| DC Field | Value | Language |
|---|
| dc.contributor.author | Golosov, D. A. | - |
| dc.contributor.author | Melnikov, S. N. | - |
| dc.contributor.author | Zavadski, S. M. | - |
| dc.contributor.author | Kolos, V. V. | - |
| dc.contributor.author | Okojie, J. | - |
| dc.date.accessioned | 2016-12-28T12:27:55Z | - |
| dc.date.accessioned | 2017-07-27T11:59:19Z | - |
| dc.date.available | 2016-12-28T12:27:55Z | - |
| dc.date.available | 2017-07-27T11:59:19Z | - |
| dc.date.issued | 2016 | - |
| dc.identifier.citation | The increase in thickness uniformity of films obtained by magnetron sputtering with rotating substrate / D. A. Golosov and other // Plasma Physics and Technology. - 2016. - Vol. 3, № 3. - P. 100-104. | ru_RU |
| dc.identifier.uri | https://libeldoc.bsuir.by/handle/123456789/11060 | - |
| dc.description.abstract | The titanium thin films obtained by magnetron sputtering with the rotating substrate at different distances between the substrate and magnetron centers were studied with regard to the uniformity of the film thickness distribution. On the basis of the experimental data obtained, the model for
the magnetron film deposition during substrate rotation was developed. The analysis of the simulation results shows that the model error is not greater than 10%. | ru_RU |
| dc.language.iso | en | ru_RU |
| dc.publisher | Department of Physics | ru_RU |
| dc.subject | публикации ученых | ru_RU |
| dc.subject | magnetron sputtering | ru_RU |
| dc.subject | deposition rate | ru_RU |
| dc.subject | film thickness | ru_RU |
| dc.title | The increase in thickness uniformity of films obtained by magnetron sputtering with rotating substrate | ru_RU |
| dc.type | Article | ru_RU |
| Appears in Collections: | Публикации в зарубежных изданиях
|
