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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/11060
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dc.contributor.authorGolosov, D. A.-
dc.contributor.authorMelnikov, S. N.-
dc.contributor.authorZavadski, S. M.-
dc.contributor.authorKolos, V. V.-
dc.contributor.authorOkojie, J.-
dc.contributor.authorГолосов, Д. А.-
dc.date.accessioned2016-12-28T12:27:55Z-
dc.date.accessioned2017-07-27T11:59:19Z-
dc.date.available2016-12-28T12:27:55Z-
dc.date.available2017-07-27T11:59:19Z-
dc.date.issued2016-
dc.identifier.citationThe increase in thickness uniformity of films obtained by magnetron sputtering with rotating substrate / D. A. Golosov and other // Plasma Physics and Technology. - 2016. - Vol. 3, № 3. - P. 100-104.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/11060-
dc.description.abstractThe titanium thin films obtained by magnetron sputtering with the rotating substrate at different distances between the substrate and magnetron centers were studied with regard to the uniformity of the film thickness distribution. On the basis of the experimental data obtained, the model for the magnetron film deposition during substrate rotation was developed. The analysis of the simulation results shows that the model error is not greater than 10%.ru_RU
dc.language.isoenru_RU
dc.publisherDepartment of Physicsru_RU
dc.subjectпубликации ученыхru_RU
dc.subjectmagnetron sputteringru_RU
dc.subjectdeposition rateru_RU
dc.subjectfilm thicknessru_RU
dc.titleThe increase in thickness uniformity of films obtained by magnetron sputtering with rotating substrateru_RU
dc.typeArticleru_RU
Appears in Collections:Публикации в зарубежных изданиях

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