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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/28134
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dc.contributor.authorShauchuk, A. G.-
dc.contributor.authorTsviatkou, V. Yu.-
dc.date.accessioned2017-11-29T08:13:53Z-
dc.date.available2017-11-29T08:13:53Z-
dc.date.issued2016-
dc.identifier.citationShauchuk A. G. Method of normalization of the contour line in thickness based on binary masks / A. G. Shauchk, V. Yu. Tsviatkou // Sadeq International Conference on Multidisciplinary in IT and Communication Science and Applications (AIC-MITCSA) (IEEE Conference Publications), 9-10 May. – 2016. – 6 pp.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/28134-
dc.description.abstractWe propose a method of normalization in thickness of the contour lines based on the analysis by mask of the local orientations of fragments. Comparison of the proposed method with known methods of thinning is held. It is shown that the proposed method is superior to the known methods of thinning on speed and quality.ru_RU
dc.language.isoenru_RU
dc.publisherIEEEru_RU
dc.subjectпубликации ученыхru_RU
dc.subjectnormalization of the contour lines in thicknessru_RU
dc.subjectthe mask analysisru_RU
dc.subjectthinningru_RU
dc.titleMethod of normalization of the contour line in thickness based on binary masksru_RU
dc.typeСтатьяru_RU
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