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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/29140
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dc.contributor.authorKhoroshko, L. S.-
dc.contributor.authorOrekhovskaya, T. I.-
dc.contributor.authorMeledina, M. V.-
dc.date.accessioned2018-01-10T13:03:40Z-
dc.date.available2018-01-10T13:03:40Z-
dc.date.issued2017-
dc.identifier.citationKhoroshko, L. S. Sol-gel coatings for photolithography on nanoporous anodic alumina and aluminum / L.S. Khoroshko, T.I. Orekhovskaya, M.V. Meledina // Nanomeeting – 2017 Proceedings of International Conference in Physics, Chemistry and Application of Nanostructures. – Singapore: World Scientific Press, 2017. – Р. 398 – 401. – DOI: https://doi.org/10.1142/9789813224537_0092.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/29140-
dc.description.abstractThe results of the patterned microstructures fabrication through electrochemical anodizing, sol-gel synthesis, photolithography and chemical etching are presented. The continuous xerogel films were used as a protective mask. They are good alternative to metal in photolithography. Perspectives of application of these structures in planar optoelectronics are discussed.ru_RU
dc.language.isoenru_RU
dc.publisherWorld Scientific Press, Singaporeru_RU
dc.subjectпубликации ученыхru_RU
dc.subjectmicrostructures fabricationru_RU
dc.subjectplanar optoelectronicsru_RU
dc.titleSol-gel coatings for photolithography on nanoporous anodic alumina and aluminumru_RU
dc.typeСтатьяru_RU
Appears in Collections:Публикации в зарубежных изданиях

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