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dc.contributor.authorHvazdouski, D. C.-
dc.contributor.authorStempitsky, V. R.-
dc.date.accessioned2019-01-03T11:25:53Z-
dc.date.available2019-01-03T11:25:53Z-
dc.date.issued2018-
dc.identifier.citationHvazdouski, D. C. Ab initio simulation of graphene interaction with SiO2 substrate for nanoelectronics application / D. C. Hvazdouski, V. R. Stempitsky // Materials Physics and Mechanics. – 2018. – V. 39. – P. 27–34.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/34032-
dc.description.abstractFirst-principles calculations were carried out by the Vienna Ab initio Simulation Package (VASP). Preliminary calculations showed that DFT-D3 method with Becke-Jonson damping present good agreement of lattice constant with experiment data. Ground state of graphene position on the SiO2 surfaces obtained has been determined. Interlayer distances between graphene and different types of quartz substrate have been calculated; the interlayer distances being 3.31 Å and 4.32 Å for models with open oxygen dangling bonds and with open silicon dangling bonds, respectively. The adsorption energy of graphene on the amorphous SiO2 surface with open oxygen dangling bonds is larger than the adsorption energy on the second type of surface. We observed the 0.12 eV band gap in the case with open oxygen dangling bonds. This kind of quartz surface can be source of a charge puddle.ru_RU
dc.language.isoenru_RU
dc.publisherInstitute of Problems of Mechanical Engineering (Russian Academy of Sciences)ru_RU
dc.subjectпубликации ученыхru_RU
dc.subjectab initio calculationsru_RU
dc.subjectadsorptionru_RU
dc.subjectamorphous SiO2ru_RU
dc.subjectgrapheneru_RU
dc.subjectsurfaceru_RU
dc.titleAb initio simulation of graphene interaction with SiO2 substrate for nanoelectronics applicationru_RU
dc.typeСтатьяru_RU
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