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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/34292
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dc.contributor.authorShimanovich, D. L.-
dc.date.accessioned2019-01-25T11:02:22Z-
dc.date.available2019-01-25T11:02:22Z-
dc.date.issued2017-
dc.identifier.citationShimanovich, D. L. Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films / D. L.Shimanovich // Physical and chemical aspects of the study of clusters, nanostructures and nanomaterials: Interuniversity collection of proceedings. – Tver: TSU, 2017. – I. 9. – P. 529-535. – DOI: 10.26456/pcascnn/2017.9.529.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/34292-
dc.description.abstractTechnological methods and conditions for additional inorganic dielectric films formation using the vacuum deposition on nanostructured porous alumina bases are investigated. Modified multilayer structures with closed porosity have been obtained. The improvement of thermophysical and electrophysical properties of finite dielectric coatings on aluminum substrates is demonstrated.ru_RU
dc.language.isoenru_RU
dc.publisherРФru_RU
dc.subjectпубликации ученыхru_RU
dc.subjectaluminumru_RU
dc.subjectelectrochemical anodizationru_RU
dc.subjectporous anode aluminaru_RU
dc.subjectnanostructured materialru_RU
dc.subjectvacuum depositionru_RU
dc.subjectthermophysical and electrophysical propertiesru_RU
dc.titleTechnological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric filmsru_RU
dc.typeСтатьяru_RU
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