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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/38238
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dc.contributor.authorSun, S. M.-
dc.contributor.authorLiu, W. J.-
dc.contributor.authorGolosov, D. A.-
dc.contributor.authorGu, C. J.-
dc.contributor.authorDing, S. J.-
dc.date.accessioned2020-01-17T09:32:53Z-
dc.date.available2020-01-17T09:32:53Z-
dc.date.issued2019-
dc.identifier.citationInvestigation of energy band at atomic layer deposited AZO/β-Ga2O3(201) heterojunctions / Sun S. M. [and others] // Nanoscale research letters. – 2019. – Vol. 14, № 1. – P. 275 – 280. – DOI: https://doi.org/10.1186/s11671-019-3092-x.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/38238-
dc.description.abstractThe Al-doped effects on the band offsets of ZnO/β-Ga2O3 interfaces are characterized by X-ray photoelectron spectroscopy and calculated by first-principle simulations. The conduction band offsets vary from 1.39 to 1.67 eV, the valence band offsets reduce from 0.06 to − 0.42 eV, exhibiting an almost linear dependence with respect to the Al doping ratio varying from 0 to 10%. Consequently, a type-I band alignment forms at the interface of ZnO/β-Ga2O3 heterojunction and the AZO/β-Ga2O3 interface has a type-II band alignment. This is because incorporating Al into the ZnO would open up the band gaps due to the strong Al and O electron mixing, and the conduction and valence band edges consequently shift toward the lower level.ru_RU
dc.language.isoenru_RU
dc.publisherSpringer Science+Business Mediaru_RU
dc.subjectпубликации ученыхru_RU
dc.subjectβ-Ga2O3ru_RU
dc.subjectContactsru_RU
dc.subjectIntermediate semiconductor layerru_RU
dc.titleInvestigation of energy band at atomic layer deposited AZO/β-Ga2O3(201) heterojunctionsru_RU
dc.typeСтатьяru_RU
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