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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/45850
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dc.contributor.authorMikhailova, T.-
dc.contributor.authorMyasoedova, T.-
dc.date.accessioned2021-11-08T07:58:49Z-
dc.date.available2021-11-08T07:58:49Z-
dc.date.issued2021-
dc.identifier.citationMikhailova, T. Investigation of the structure of manganese-doped silicon-carbon films obtained by electrochemical method / T. Mikhailova, T. Myasoedova // Nano-Desing, Tehnology, Computer Simulations=Нанопроектирование, технология, компьютерное моделирование (NDTCS-2021) : тезисы докладов XIX Международного симпозиума, Минск, 28-29 октября 2021 года / Белорусский государственный университет информатики и радиоэлектроники ; редкол.: В. А. Богуш [и др.]. – Минск, 2021. – P. 28–30.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/45850-
dc.description.abstractThe electrochemical deposition method makes it possible to obtain silicon-carbon complex structures. The influence of the structure of the obtained films on their properties requires further study.ru_RU
dc.language.isoenru_RU
dc.publisherБГУИРru_RU
dc.subjectматериалы конференцийru_RU
dc.subjectconference proceedingsru_RU
dc.subjectsilicon-carbonru_RU
dc.subjectelectrochemical methodru_RU
dc.titleInvestigation of the structure of manganese-doped silicon-carbon films obtained by electrochemical methodru_RU
dc.typeСтатьяru_RU
Appears in Collections:NDTCS 2021

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