| DC Field | Value | Language |
|---|
| dc.contributor.author | Stanchik, A. | - |
| dc.contributor.author | Gremenok, V. | - |
| dc.contributor.author | Trukhanova, E. L. | - |
| dc.contributor.author | Khoroshko, V. V. | - |
| dc.contributor.author | Suleymanov, S. X. | - |
| dc.contributor.author | Dyskin, V. G. | - |
| dc.contributor.author | Djanklich, M. U. | - |
| dc.contributor.author | Kulagina, N. A. | - |
| dc.contributor.author | Amirov Shakhboz Yo. ugli | - |
| dc.coverage.spatial | Москва | ru_RU |
| dc.date.accessioned | 2023-02-20T07:15:56Z | - |
| dc.date.available | 2023-02-20T07:15:56Z | - |
| dc.date.issued | 2022 | - |
| dc.identifier.citation | Investigation of thin films MgAl2O4, deposited on the Si substrates by vacuum thermal evaporation / Stanchik A. [et al.] // Computational Nanotechnology. – 2022. – Iss. 1. – P. 125–131. – DOI : 10.33693/2313-223X-2022-9-1-125-131. | ru_RU |
| dc.identifier.uri | https://libeldoc.bsuir.by/handle/123456789/50114 | - |
| dc.description.abstract | The article presents data on the study of X-ray structural and microstructural characteristics of thin films of aluminum-magnesium spinel MgAl2O4 deposited on Si substrates by vacuum thermal evaporation. MgAl2O4 films have a polycrystalline rhombic structure. The values of the unit cell parameters of MgAl2O4 are calculated. Scanning electron and atomic force microscopy showed that MgAl2O4 films have a densely packed structure without cracks. Physical characteristics and good adhesion of MgAl2O4 thin films to silicon substrates indicate their possibility of using in devices of opto- and microelectronics. | ru_RU |
| dc.language.iso | en | ru_RU |
| dc.publisher | Юр-ВАК | ru_RU |
| dc.subject | публикации ученых | ru_RU |
| dc.subject | thin films | ru_RU |
| dc.subject | aluminum-magnesium spinel | ru_RU |
| dc.subject | X-ray structural analysis | ru_RU |
| dc.subject | microstructure | ru_RU |
| dc.subject | unit cell parameters | ru_RU |
| dc.subject | rhombic structure | ru_RU |
| dc.title | Investigation of thin films MgAl2O4, deposited on the Si substrates by vacuum thermal evaporation | ru_RU |
| dc.type | Article | ru_RU |
| Appears in Collections: | Публикации в зарубежных изданиях
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