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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/62551
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dc.contributor.authorGalkin, N. G.-
dc.contributor.authorSubbotin, E. Yu.-
dc.contributor.authorGalkin, K. N.-
dc.contributor.authorGoroshko, D. L.-
dc.contributor.authorGoroshko, O. A.-
dc.contributor.authorMigas, D. B.-
dc.contributor.authorFilonov, A. B.-
dc.contributor.authorTkachenkod, I. A.-
dc.contributor.authorSamardak, A. Yu.-
dc.coverage.spatialUnited Kingdomen_US
dc.date.accessioned2025-12-29T07:21:36Z-
dc.date.available2025-12-29T07:21:36Z-
dc.date.issued2025-
dc.identifier.citationUltra-thin and thin CrSi films on Si(111): II. Transport and magnetic properties / N. G. Galkin, E. Yu. Subbotin, K. N. Galkin [et al.] // Journal of Materials Chemistry C. – 2025. – Vol. 13, iss. 6. – P. 2875–2886.en_US
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/62551-
dc.description.abstractThis section presents the results on the transport, magnetotransport, and magnetic properties of ultrathin CrSi films and thin CrSi films. In ultrathin CrSi films (3.19 nm with a predominant contribution from the m-CrSi phase), quantum magnetoresistance with an extremely low magnetoresistance effect (0.025–0.10%) is observed at 2–30 K; however, in the temperature range of 40–100 K, the ordinary and anomalous Hall effects for holes coexist. The majority of charge carriers in thin (approximately 31–47.7 nm) CrSi films consisting of the m-CrSi and c-CrSi phases are holes with a concentration of 2.6 × 10²² cm⁻³ and a mobility of 4.78–4.95 cm² V⁻¹ s⁻¹.en_US
dc.language.isoenen_US
dc.publisherRoyal Society of Chemistryen_US
dc.subjectпубликации ученыхen_US
dc.subjectultrathin filmsen_US
dc.subjectCrSien_US
dc.subjectmagnetotransporten_US
dc.subjectmagnetic propertiesen_US
dc.titleUltra-thin and thin CrSi films on Si(111): II. Transport and magnetic propertiesen_US
dc.typeArticleen_US
dc.identifier.DOI10.1039/d4tc03123g-
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