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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/62560
Title: Structure and electronic properties of RuSi, OsSi, RhSi, ReSi and IrSi
Authors: Migas, D. B.
Filonov, A. B.
Galkin, N. G.
Skorodumova, N. V.
Keywords: публикации ученых;electronic properties;thermoelectricity;single crystals;hybrid functionalities;silicides
Issue Date: 2025
Publisher: Institute of Pure and Applied Physics
Citation: Structure and electronic properties of RuSi, OsSi, RhSi, ReSi and IrSi / D. B. Migas, A. B. Filonov, N. G. Galkin, N. V. Skorodumova // Japanese Journal of Applied Physics. – 2025. – Vol. 64, № 11. – Р. 110803.
Abstract: RuSi, OsSi, RhSi, ReSi and IrSi in different phases have been investigated by means of ab initio techniques within the hybrid functional. RuSi and OsSi have the cubic (space group P213, #198) structure and display semiconducting properties, while the conducting high-temperature cubic phase (space group Pm3m, #221) is sizably higher in energy. The ground state for RhSi and IrSi is the orthorhombic (space group Pnma, #62) structure, while for ReSi it is monoclinic (space group P21/c, #14) with the cubic phase (space group P213, #198) to be higher in total energy. The Dirac nodes and cones as well as crossing bands with linear dispersion are found for RhSi, ReSi and IrSi in the orthorhombic phase. These monosilicides in the monoclinic phase can be viewed as gapless semiconductors except for IrSi with the band gap of 0.23 eV.
URI: https://libeldoc.bsuir.by/handle/123456789/62560
DOI: 10.35848/1347-4065/ae1842
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