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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/66049
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dc.contributor.authorBely, G. V.-
dc.contributor.authorLopato, U. P.-
dc.contributor.authorBondarenko, V. P.-
dc.contributor.authorGrevtsov, N. L.-
dc.contributor.authorChubenko, E. B.-
dc.coverage.spatialGermanyen_US
dc.date.accessioned2026-11-03T11:34:25Z-
dc.date.available2026-11-03T11:34:25Z-
dc.date.issued2026-
dc.identifier.citationFormation of a dielectric material derived from oxidized porous silicon and titanium oxide for integrated optical waveguides / G. V. Bely, U. P. Lopato, V. P. Bondarenko [et al.] // Journal of Applied Spectroscopy. – 2026. – Vol. 93, No. 4. – P. 817–823.en_US
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/66049-
dc.description.abstractFeasibility is demonstrated for obtaining a dielectric material derived from oxidized porous silicon and titanium oxide by depositing the latter onto porous silicon using a sol-gel method followed by high-temperature oxidation. The resulting dielectric material has an enhanced refractive index, making it promising for creating low-loss integrated optical channel waveguides in bulk microassemblies of electronic circuits with optical interconnects.en_US
dc.language.isoenen_US
dc.publisherSpringer Natureen_US
dc.subjectпубликации ученыхen_US
dc.subjectporous siliconen_US
dc.subjectsilicon oxideen_US
dc.subjecttitanium oxideen_US
dc.subjectsol-gel methoden_US
dc.subjectthermal oxidationen_US
dc.subjectrefractive indexen_US
dc.subjectoptical waveguideen_US
dc.titleFormation of a dielectric material derived from oxidized porous silicon and titanium oxide for integrated optical waveguidesen_US
dc.typeArticleen_US
dc.identifier.DOIDOI 10.1007/s10812-026-02154-6-
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