|Title:||Electrochemical Deposition and Characterization of Ni in Mesoporous Silicon|
|Authors:||Prischepa, S. L.|
Dolgiy, A. L.
Redko, S. V.
Bandarenka, H. V.
Yanushkevich, K. I.
Bondarenko, V. P.
Прищепа, С. Л.
Долгий, А. Л.
Редько, С. В.
Бондаренко, А. В.
Янушкевич, К. И.
Бондаренко, В. П.
|Publisher:||Journal of The Electrochemical Society|
|Citation:||Electrochemical Deposition and Characterization of Ni in Mesoporous Silicon / A. Dolgiy and others // Journal of The Electrochemical Society. – 2012. – V. 159. – Р. 623 – 627.|
|Abstract:||Nickel nanowires have been formed by stationary electrochemical deposition of nickel into mesoporous silicon templates from the modiﬁed Watts bath. Monitoring of the porous silicon potential during the electrochemical deposition has given the determination of the emergence of Ni on the outer surface of porous layer. Maximum ﬁlling factor of porous silicon with Ni has been achieved to 67%. The pore dimensions have been found to deﬁne the length and diameter of the Ni nanowires that have equaled to 10 μm and 100–120 nm, respectively. The polycrystalline nature of the nickel nanowires, as well as the expansion of nickel lattice constant in comparison with bulk material has been established by analyzing the X-ray diffraction spectra. The synthesized samples have possessed ferromagnetic properties, which have been conﬁrmed by temperature measurements of the magnetization. Smaller values of the speciﬁc magnetization of the Ni/PS samples and the atomic magnetic moment of Ni atoms at the low temperature with respect to those of bulk material have been suggested to be mostly caused by formation of nickel silicide at the beginning of the Ni electrochemical deposition.|
|Appears in Collections:||Публикации в зарубежных изданиях|
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