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Title: Effect of continuous magnetic field on the growth mechanism of nanoporous anodic alumina films on different substrates
Authors: Vrublevsky, I. A.
Chernyakova, E. V.
Ispas, A.
Bund, A.
Keywords: публикации ученых;nanoporous anodic;alumina;magnetic field;surface morphology;pore diameter
Issue Date: 2016
Publisher: Springer-Verlag Berlin Heidelberg, Germany
Citation: Vrublevsky, I. A. Effect of continuous magnetic field on the growth mechanism of nanoporous anodic alumina films on different substrates / I. A. Vrublevsky and others // Journal of Solid State Electrochemistry. – 2016. - Volume 20. - Issue 10. - Рp. 2765–2772. - DOI 10.1007/s10008-016-3274-8.
Abstract: The effects induced by an external homogeneous magnetic field on the oxide film growth on aluminum in aqueous solutions of oxalic and sulfuric acid and on surface morphology of the alumina films were studied. Aluminum films of 100 nm thickness were prepared by thermal evaporation on SiO2/Si and glass-ceramic substrates. The pore diameter for oxalic acid alumina films on the SiO2/Si substrate decreased by 0.8 nm, the interpore distance by 5.9 nm, and cell diameter by 6.9 nm if a magnetic field of 0.5 T was applied. When aluminum was anodized in sulfuric acid on the same substrate, the significant changes in parameters of porous structure of alumina, which were similar to the ones in oxalic acid, are firstly observed in stronger magnetic fields (of 0.7 T). On the basis of data obtained in this study and of previous investigation on the negative space charge and thermally activated defects in anodic alumina, we concluded that the intensity of the magnetic field is associated with energy of electron traps and that the changes of cell diameter characterize the trap concentration. The energy of electron traps in oxalic acid alumina films was proved to be smaller than the one in films formed in sulfuric acid, but the concentration of traps was of the same order of magnitude. When the substrate was replaced with the glass-ceramic one, the pore diameter in oxalic acid alumina films increased to ca. 17.6 nm.
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