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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/11383
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dc.contributor.authorBalucani, M.-
dc.contributor.authorBondarenko, V. P.-
dc.contributor.authorLamedica, G.-
dc.contributor.authorFerrari, A.-
dc.contributor.authorYakovtseva, V. A.-
dc.contributor.authorDolgyi, L.-
dc.contributor.authorVorozov, N.-
dc.contributor.authorVolchek, S. A.-
dc.contributor.authorPetrovich, V. A.-
dc.contributor.authorKazuchits, N.-
dc.date.accessioned2017-01-20T09:32:37Z-
dc.date.accessioned2017-07-27T12:23:19Z-
dc.date.available2017-01-20T09:32:37Z-
dc.date.available2017-07-27T12:23:19Z-
dc.date.issued2001-
dc.identifier.citationBalucani, M. Er-doped oxidized porous silicon waveguides / M. Balucani and others // Thin Solid Films. – 2001. - Vol. 396. - P. 201 – 203.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/11383-
dc.description.abstractThe present work reports Er-doped channel oxidized porous silicon waveguides (OPSWG) formed from n+-type Si by the two-step anodisation process. Er has been introduced into porous silicon before oxidation by a cathodic treatment in 0.1 M Er (NO3)3 aqueous solution. A correlation between Er concentration and refractive index profiles has shown dominant core doping with Er relative to cladding regions. Reported Er concentration of 0.8 at.% in the OPSWG is large enough to attain the amplification effect.ru_RU
dc.language.isoenru_RU
dc.publisherElsevierru_RU
dc.subjectпубликации ученыхru_RU
dc.subjecterbiumru_RU
dc.subjectporous siliconru_RU
dc.subjectoptoelectronic devicesru_RU
dc.titleEr-doped oxidized porous silicon waveguidesru_RU
dc.typeArticleru_RU
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