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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/28463
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dc.contributor.authorShimanovich, D. L.-
dc.contributor.authorYakovtseva, V.-
dc.contributor.authorSokol, V.-
dc.contributor.authorSubko, A.-
dc.date.accessioned2017-12-11T11:28:40Z-
dc.date.available2017-12-11T11:28:40Z-
dc.date.issued2017-
dc.identifier.citationInternal stress in aluminum layers deposited on dielectric substrates for sensor applications / D. Shimanovich and others // Nano-design, technology, computer simulations : proceedings of 17th International workshop on new approaches to high –tech (26-27 October, 2017). – Minsk : BSUIR, 2017. – С. 40 - 42.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/28463-
dc.description.abstractIn this paper the analysis of the internal stresses in deposited aluminum layers is demonstrated and dependences of the internal stresses on the thickness of the aluminum films deposited at various substrate temperatures and evaporation rates are studied. The study may be applied to fabricate the nanoporous alumina coatings for different kinds of high-sensitive sensors.ru_RU
dc.language.isoenru_RU
dc.publisherБГУИРru_RU
dc.subjectматериалы конференцийru_RU
dc.subjectanodic aluminaru_RU
dc.subjectinternal stressesru_RU
dc.subjectsensorru_RU
dc.titleInternal stress in aluminum layers deposited on dielectric substrates for sensor applicationsru_RU
dc.typeСтатьяru_RU
Appears in Collections:NDTCS 2017

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