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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/11060
Title: The increase in thickness uniformity of films obtained by magnetron sputtering with rotating substrate
Authors: Golosov, D. A.
Melnikov, S. N.
Zavadski, S. M.
Kolos, V. V.
Okojie, J.
Голосов, Д. А.
Keywords: публикации ученых
magnetron sputtering
deposition rate
film thickness
Issue Date: 2016
Publisher: Department of Physics
Citation: The increase in thickness uniformity of films obtained by magnetron sputtering with rotating substrate / D. A. Golosov and other // Plasma Physics and Technology. - 2016. - Vol. 3, № 3. - P. 100-104.
Abstract: The titanium thin films obtained by magnetron sputtering with the rotating substrate at different distances between the substrate and magnetron centers were studied with regard to the uniformity of the film thickness distribution. On the basis of the experimental data obtained, the model for the magnetron film deposition during substrate rotation was developed. The analysis of the simulation results shows that the model error is not greater than 10%.
URI: https://libeldoc.bsuir.by/handle/123456789/11060
Appears in Collections:Публикации в зарубежных изданиях

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