Skip navigation
Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/50114
Title: Investigation of thin films MgAl2O4, deposited on the Si substrates by vacuum thermal evaporation
Authors: Stanchik, A.
Gremenok, V.
Trukhanova, E. L.
Khoroshko, V. V.
Suleymanov, S. X.
Dyskin, V. G.
Djanklich, M. U.
Kulagina, N. A.
Amirov Shakhboz Yo. ugli
Keywords: публикации ученых;thin films;aluminum-magnesium spinel;X-ray structural analysis;microstructure;unit cell parameters;rhombic structure
Issue Date: 2022
Publisher: Юр-ВАК
Citation: Investigation of thin films MgAl2O4, deposited on the Si substrates by vacuum thermal evaporation / Stanchik A. [et al.] // Computational Nanotechnology. – 2022. – Iss. 1. – P. 125–131. – DOI : 10.33693/2313-223X-2022-9-1-125-131.
Abstract: The article presents data on the study of X-ray structural and microstructural characteristics of thin films of aluminum-magnesium spinel MgAl2O4 deposited on Si substrates by vacuum thermal evaporation. MgAl2O4 films have a polycrystalline rhombic structure. The values of the unit cell parameters of MgAl2O4 are calculated. Scanning electron and atomic force microscopy showed that MgAl2O4 films have a densely packed structure without cracks. Physical characteristics and good adhesion of MgAl2O4 thin films to silicon substrates indicate their possibility of using in devices of opto- and microelectronics.
URI: https://libeldoc.bsuir.by/handle/123456789/50114
Appears in Collections:Публикации в зарубежных изданиях

Files in This Item:
File Description SizeFormat 
Investigation_of_thin.pdf73.38 kBAdobe PDFView/Open
Show full item record Google Scholar

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.