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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/64807
Title: Influence of pretreatment methods on the formation of thin-film nickel electrodes for capacitive sensors
Authors: Panfilenko, E. D.
Provlockaya, D. V.
Keywords: материалы конференций;thin films;nickel;sitall;ion-beam sputtering;atmospheric pressure plasma;surface cleaning;capacitive sensors
Issue Date: 2026
Publisher: БГУИР
Citation: Panfilenko, E. D. Influence of pretreatment methods on the formation of thin-film nickel electrodes for capacitive sensors / E. D. Panfilenko, D. V. Provlockaya // Электронные системы и технологии : сборник материалов 62-й научной конференции аспирантов, магистрантов и студентов БГУИР, Минск, 13–17 апреля 2026 г. / Белорусский государственный университет информатики и радиоэлектроники ; редкол.: П. В. Камлач [и др.]. – Минск, 2026. – С. 831–835.
Abstract: The paper investigates the influence of pretreatment methods for sitall ST-50-1-1-0,6 substrates surface on the subsequent formation of thin-film nickel electrodes for capacitive sensors for heavy metal ions detection in water. A comparison of two cleaning methods was carried out: ion-beam cleaning in vacuum and treatment in a dielectric barrier discharge plasma torch at atmospheric pressure. Optimal cleaning regimes ensuring maximum adhesion and quality of the formed films were established. Nickel films with a thickness of 100 nm were obtained by ion-beam sputtering; their optical properties and surface morphology were studied.
URI: https://libeldoc.bsuir.by/handle/123456789/64807
Appears in Collections:Электронные системы и технологии : материалы 62-й конференции аспирантов, магистрантов и студентов (2026)

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